Polysilicon Finishing and Cleaning
Polysilicon Finishing Systems: Chunks, Ingots, Granular and Fines
Remove Metallic, Organic Contamination of Silicon, Clean Oxide Growth
Purity of Polysilicon is critical in the PV manufacturing process. High purity levels of 99.9999999 % (nine nines) are currently required in raw materials for semiconductor manufacturing. In research and production, contamination is an issue. Even for Solar grade Polysilicon, Oxide growths (especially during drying), metal impurities, handling contaminants and saw contamination can impact yields. Controlling chips and fines in the cleaning process to maintain up-time, and to protect valves and pumps is important. High performance polysilicon (polySi) finishing and cleaning is critical.
MEI is a leader in polysilicon finishing and your partner in maintaining purity with high throughput, automated polySi cleaning, whether you’re doing research or in high volume production.
Leadership in Polysilicon Finishing: Achieving Nine Nines, or even Solar grade purity, isn’t easy.
When you’re working towards ultimate purity, MEI is your partner of choice. All of our PolySilicon cleaning systems offer fully customizable process step configuration of the tanks, with accurate dosing, chemical blending & spiking…and our unique, patented oxide prevention drying process. We are committed to low cost of ownership, reliability, safety and efficient performance.
Etching, Cleaning and Drying Granular (FBR) Polysilicon and Silicon Fines, and Reclaim is Challenging
MEI Pura TM – Automated Polysilicon Cleaning Equipment
Custom Systems for your PolySilicon Process
- Breakthrough drying with FlashDryTM technology
- Etch with excellent etch uniformity
- Rinse removes etch chemistry and contaminants efficiently
- Multiple Recipe Management
- Flexible Process Design
- Efficient Footprint – 60% reduced footprint
- High Throughput- 3 min 20Kg basket output
- Uses 20% of the energy of conventional drying
MEI Polysilicon Finishing and Cleaning Equipment:
Polysilicon Cleaning Rods, Chunks, Granular (FBR), Fines, Sand and Reclaim
The MEI PURA wet processing system with FlashDry Technology is ideal for removal of organic and metallic contamination found on Si ingots, rods or chunks, and especially granular and fines in the silicon manufacturing process. MEI’s high throughput wet etch system offers excellent process control and patent pending, outstanding drying capabilities to achieve optimal purity. Safety, particularly with HNA etch, and reliability are designed in.
Polysilicon Wafer Cleaning Equipment
MEI’s Solar Evolution fully automated solar wafer cleaning system is a Dry to Dry, High Throughput, Reliable, production wet process system, with a low cost of ownership. For Solar wafer processing, the MEI Solar Evolution provides high throughput, because it is able to process multiple lots and multiple recipes simultaneously, using the sophisticated process controls of MEI’s proprietary IDX Automation Software.