Dual Robot Wet Bench for Semiconductor Wafer Processing
Advancer Gemini Dual Robot Semi-Auto Wet Bench: Save Space, More Process Steps
The Advancer Gemini Dual Robot Wet Process System is a popular space and cost efficient alternative to rotary platforms. The Advancer Gemini wet bench provides tremendous processing capacity within an extremely small footprint for a relatively low cost by incorporating:
- Dual process tanks per module
- Shared facilities
- Shared electronics
- Single control PC driven I/O system
Fewer facility connections aids in the speed, ease and overall expense of installation. Shared module designs also provide for lower exhaust requirements. MEI’s Semi-Automated Gemini wet benches offer all the same features and capabilities of the original Advancer wet bench but produce more throughput per square foot. The Advancer Gemini wet bench can also be better configured for sequential process steps within a single module.
Applications Include:
- HF or BOE Etch
- Nitride
- SC1 Megasonic
- SC2
- Resist Strip
- BOEL Solvents
All of MEI’s Wet Benches, Wet Stations and Wet Processing Equipment Are:
- Flexible and Upgradeable
- Easy to Use and Well Controlled
- Tailored
- Production Ready
- Designed for Safety
- Maintenance Friendly
- Reliable
- Supported
- More about our Wet Bench Features & Benefits and Design Process